Deep reactive-ion etching

Results: 81



#Item
51Fraunhofer  IMS F RAU N HOF E R I NST I T U T E F O R M IC RO E L EC T RO N I C C I RCU I T S A N D SYS T E MS I MS

Fraunhofer IMS F RAU N HOF E R I NST I T U T E F O R M IC RO E L EC T RO N I C C I RCU I T S A N D SYS T E MS I MS

Add to Reading List

Source URL: www.ims.fraunhofer.de

Language: English - Date: 2014-02-15 05:02:23
52Marvell NanoLab  Member login Lab Manual Contents

Marvell NanoLab Member login Lab Manual Contents

Add to Reading List

Source URL: nanolab.berkeley.edu

Language: English - Date: 2012-11-20 13:15:45
53Analytical Techniques for Trace Elemental Analyses on Wafer Surfaces for Monitoring and Controlling Contamination J. Wang, M. K. Balazs Balazs Analytical Laboratory, Sunnyvale, CA[removed]P. Pianetta, K. Baur and S. Brenna

Analytical Techniques for Trace Elemental Analyses on Wafer Surfaces for Monitoring and Controlling Contamination J. Wang, M. K. Balazs Balazs Analytical Laboratory, Sunnyvale, CA[removed]P. Pianetta, K. Baur and S. Brenna

Add to Reading List

Source URL: www-project.slac.stanford.edu

Language: English - Date: 2003-04-14 02:31:05
541– 6 February  Technical Summaries www.spie.org/pw  Conferences and Courses

1– 6 February Technical Summaries www.spie.org/pw Conferences and Courses

Add to Reading List

Source URL: spie.org

Language: English - Date: 2014-10-28 11:09:21
55Nanoscale Strength Measurements and Standards Objective Impact and Customers • The MEMS industry currently generates revenues of about $45B/year, dominated by two non-contact devices: inkjet

Nanoscale Strength Measurements and Standards Objective Impact and Customers • The MEMS industry currently generates revenues of about $45B/year, dominated by two non-contact devices: inkjet

Add to Reading List

Source URL: www.nist.gov

Language: English - Date: 2012-10-04 11:43:10
56GENESIS CONCENTRATOR TARGET PARTICLE CONTAMINATION MAPPING AND MATERIAL IDENTIFICATION Michael J. Calaway 1, Melissa C. Rodriguez 2, and Judith H. Allton[removed]Jacobs (ESCG) at NASA Johnson Space Center, Houston, TX (2)

GENESIS CONCENTRATOR TARGET PARTICLE CONTAMINATION MAPPING AND MATERIAL IDENTIFICATION Michael J. Calaway 1, Melissa C. Rodriguez 2, and Judith H. Allton[removed]Jacobs (ESCG) at NASA Johnson Space Center, Houston, TX (2)

Add to Reading List

Source URL: curator.jsc.nasa.gov

Language: English - Date: 2013-09-16 21:16:11
57Microsoft Word - vh_man_2400_en_05112903_ls.doc

Microsoft Word - vh_man_2400_en_05112903_ls.doc

Add to Reading List

Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:10:47
58Deep Si Etching at the UCSB Nanofabrication Facility Silicon Deep RIE/ICP – Bosch Si- DRIE

Deep Si Etching at the UCSB Nanofabrication Facility Silicon Deep RIE/ICP – Bosch Si- DRIE

Add to Reading List

Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:10:49
59GaInAs/AlInAs/InP RIE Etching at the UCSB Nanofabrication Facility Methane/Hydrogen/Argon – Parallel Plate RIE #2

GaInAs/AlInAs/InP RIE Etching at the UCSB Nanofabrication Facility Methane/Hydrogen/Argon – Parallel Plate RIE #2

Add to Reading List

Source URL: www.nanotech.ucsb.edu

Language: English - Date: 2013-01-06 22:10:49
60Microsoft Word - Paper 3DOF Nanopositioner_D16b_2ndReview05

Microsoft Word - Paper 3DOF Nanopositioner_D16b_2ndReview05

Add to Reading List

Source URL: www.nist.gov

Language: English - Date: 2014-06-10 11:58:56